A Virtual Metrology Model Based on Recursive Canonical Variate Analysis with Applications to Sputtering Process
Vol 24 (2011)

A Virtual Metrology Model Based on Recursive Canonical Variate Analysis with Applications to Sputtering Process

Research Articles
https://doi.org/10.3303/CET1124062
Published 20 April 2011
Pan, T.H.
Wong, D.S.H.
Jang, S.S.
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How to Cite

Pan T., Wong D., Jang S., 2011, A Virtual Metrology Model Based on Recursive Canonical Variate Analysis with Applications to Sputtering Process, Chemical Engineering Transactions, 24, 367-372.
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Abstract

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