Study on the Large Area Diamond Film Deposition in a Self- built Overmoded Microwave Power Chemical Vapor Deposition Device

Abstract

With a self-built overmoded microwave plasma chemical vapor deposition device, the effect of the gas flow rate variation on the uniform deposition of diamond films on molybdenum of 100 millimeter diameter was studied. The plasma density was 1.0×10¹⁹/m³ when the microwave power was 5.0 kW and the gas pressure was 10.0 kPa. The ovemoded MPCVD device presented good stability of the gas flow rate field distribution. The substrate surface can be well covered when the hydrogen flow rate varied from 50 to 800 sccm. The uniform diamond film with good quality was obtained at an intermediate gas flow rate, 300 sccm. The diamond film with good quality, 5.74 cm^-1 as FWHM value and high growth rate, 5.8 μm/h was deposited when the gas flow rate was 300 sccm.